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Bastien Bruneau
Bastien Bruneau
Verified email at polytechnique.edu
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Year
Strong ionization asymmetry in a geometrically symmetric radio frequency capacitively coupled plasma induced by sawtooth voltage waveforms
B Bruneau, T Gans, D O’Connell, A Greb, EV Johnson, JP Booth
Physical review letters 114 (12), 125002, 2015
1302015
Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF4
S Brandt, B Berger, E Schüngel, I Korolov, A Derzsi, B Bruneau, ...
Plasma Sources Science and Technology 25 (4), 045015, 2016
682016
Ion flux asymmetry in radiofrequency capacitively-coupled plasmas excited by sawtooth-like waveforms
B Bruneau, T Novikova, T Lafleur, JP Booth, EV Johnson
Plasma Sources Science and Technology 23 (6), 065010, 2014
682014
Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4
B Bruneau, T Lafleur, T Gans, D O’Connell, A Greb, I Korolov, A Derzsi, ...
Plasma Sources Science and Technology 25 (1), 01LT02, 2015
542015
Control and optimization of the slope asymmetry effect in tailored voltage waveforms for capacitively coupled plasmas
B Bruneau, T Novikova, T Lafleur, JP Booth, EV Johnson
Plasma Sources Science and Technology 24 (1), 015021, 2014
512014
Power coupling mode transitions induced by tailored voltage waveforms in capacitive oxygen discharges
A Derzsi, B Bruneau, AR Gibson, E Johnson, D O’Connell, T Gans, ...
Plasma Sources Science and Technology 26 (3), 034002, 2017
452017
Tailored voltage waveform capacitively coupled plasmas in electronegative gases: frequency dependence of asymmetry effects
E Schüngel, I Korolov, B Bruneau, A Derzsi, E Johnson, D O’Connell, ...
Journal of Physics D: Applied Physics 49 (26), 265203, 2016
342016
Growth mechanisms study of microcrystalline silicon deposited by SiH4/H2 plasma using tailored voltage waveforms
B Bruneau, J Wang, JC Dornstetter, EV Johnson
Journal of Applied Physics 115 (8), 2014
302014
Slope and amplitude asymmetry effects on low frequency capacitively coupled carbon tetrafluoride plasmas
B Bruneau, I Korolov, T Lafleur, T Gans, D O'Connell, A Greb, A Derzsi, ...
Journal of Applied Physics 119 (16), 2016
242016
Understanding the amorphous-to-microcrystalline silicon transition in SiF4/H2/Ar gas mixtures
JC Dornstetter, B Bruneau, P Bulkin, EV Johnson, P Roca i Cabarrocas
The Journal of Chemical Physics 140 (23), 2014
232014
Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms
B Bruneau, T Lafleur, JP Booth, E Johnson
Plasma Sources Science and Technology 25 (2), 025006, 2016
222016
Ion energy threshold in low-temperature silicon epitaxy for thin-film crystalline photovoltaics
B Bruneau, R Cariou, JC Dornstetter, M Lepecq, JL Maurice, ...
IEEE Journal of photovoltaics 4 (6), 1361-1367, 2014
202014
Experimental benchmark of kinetic simulations of capacitively coupled plasmas in molecular gases
Z Donkó, A Derzsi, I Korolov, P Hartmann, S Brandt, J Schulze, B Berger, ...
Plasma Physics and Controlled Fusion 60 (1), 014010, 2018
182018
Effect of ion energy on microcrystalline silicon material and devices: a study using tailored voltage waveforms
B Bruneau, M Lepecq, J Wang, JC Dornstetter, JL Maurice, EV Johnson
IEEE Journal of Photovoltaics 4 (6), 1354-1360, 2014
182014
Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: excitation dynamics and ion flux asymmetry
B Bruneau, P Diomede, DJ Economou, S Longo, T Gans, D O’Connell, ...
Plasma Sources Science and Technology 25 (4), 045019, 2016
162016
Material and growth mechanism studies of microcrystalline silicon deposited from SiF4/H2/Ar gas mixtures
JC Dornstetter, J Wang, B Bruneau, EV Johnson, P Roca i Cabarrocas
Canadian Journal of Physics 92 (7/8), 740-743, 2014
162014
Excitation of Ar, O2, and SF6/O2 plasma discharges using tailored voltage waveforms: control of surface ion bombardment energy and determination of the dominant electron …
G Fischer, K Ouaras, E Drahi, B Bruneau, EV Johnson
Plasma Sources Science and Technology 27 (7), 074003, 2018
112018
Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: vibrational kinetics and negative ions control
P Diomede, B Bruneau, S Longo, E Johnson, JP Booth
Plasma Sources Science and Technology 26 (7), 075007, 2017
102017
Maskless and contactless patterned silicon deposition using a localized PECVD process
R Leal, B Bruneau, P Bulkin, T Novikova, F Silva, N Habka, EV Johnson
Plasma Sources Science and Technology 29 (2), 025023, 2020
72020
Maskless interdigitated a-Si: H PECVD process on full M0 c-Si wafer: Homogeneity and passivation assessment
K Ouaras, S Filonovich, B Bruneau, J Wang, M Ghosh, E Johnson
Solar Energy Materials and Solar Cells 246, 111927, 2022
52022
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