| Analysis of wafer heating in 14nm DUV layers L Subramany, WJ Chung, P Samudrala, H Gao, N Aung, JM Gomez, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 13 | 2016 |
| Overlay control for 7nm technology node and beyond N Aung, WJ Chung, P Samudrala, H Gao, W Gao, D Brown, G He, B Park, ... Optical Microlithography XXXI 10587, 62-73, 2018 | 12 | 2018 |
| High performance compliant wafer test probe SJ Chey, DM Fregeau, DS Zupanski-Nielsen, A Prabhakar, P Samudrala, ... US Patent 8,487,304, 2013 | 12 | 2013 |
| Reactive deposition of dielectrics by ion beam assisted E-beam evaporation J Nightingale, T Cornell, P Samudrala, P Poloju, LA Hornak, D Korakakis MRS Online Proceedings Library (OPL) 983, 0983-LL05-01, 2006 | 6 | 2006 |
| Advanced overlay: sampling and modeling for optimized run-to-run control L Subramany, WJ Chung, P Samudrala, H Gao, N Aung, JM Gomez, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 5 | 2016 |
| Alumina waveguide characterization and SPARROW biosensor modeling PK Samudrala | 4 | 2006 |
| CDU budget breakdown as a diagnostic method for imaging sensitivity in HVM YK Kim, P Samudrala, JM Gomez, P Nikolsky, R Anunciado, M Barkelid, ... Optical Microlithography XXIX 9780, 247-259, 2016 | 3 | 2016 |
| Comparison study of diffraction based overlay and image based overlay measurements on programmed overlay errors H Gao, WJ Chung, N Aung, L Subramany, P Samudrala, JM Gomez Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 3 | 2016 |
| Overlay optimization for 1x node technology and beyond via rule based sparse sampling NL Aung, WJ Chung, L Subramany, S Hussain, P Samudrala, H Gao, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 3 | 2016 |
| Characterization of Alumina Optical Waveguides Grown by Ion Beam Assisted Deposition for SPARROW Biosensors P Poloju, PK Samudrala, JR Nightingale, D Korakakis, LA Hornak MRS Online Proceedings Library (OPL) 967, 0967-U05-12, 2006 | 3 | 2006 |
| Novel methodology to optimize wafer alignment to enhance 14nm on product overlay P Samudrala, WJ Chung, L Subramany, H Gao, N Aung, SC Oh, S Lee, ... Optical Microlithography XXX 10147, 530-535, 2017 | 2 | 2017 |
| Focus control enhancement and on-product focus response analysis methodology YK Kim, YJ Chen, X Hao, P Samudrala, JM Gomez, MO Mahoney, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 2 | 2016 |
| Alignment solutions on FBEOL layers using ASML scanners: AEPM: Advanced equipment processes and materials P Samudrala, G Hart, YJ Chen, L Subramany, H Gao, N Aung, WJ Chung, ... 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2018 | 1 | 2018 |
| Mix-and-match considerations for EUV insertion in N7 HVM X Chen, A Gabor, P Samudrala, S Meyers, E Hosler, R Johnson, N Felix Extreme Ultraviolet (EUV) Lithography VIII 10143, 58-67, 2017 | 1 | 2017 |
| Alignment solutions on FBEOL layers using ASML scanners P Samudrala, G Hart, YJ Chen, L Subramany, H Gao, N Aung, WJ Chung, ... Optical Microlithography XXX 10147, 523-529, 2017 | 1 | 2017 |
| High performance compliant wafer test probe SJ Chey, DM Fregeau, DS Zupanski-Nielsen, A Prabhakar, P Samudrala, ... US Patent 9,335,346, 2016 | | 2016 |
| Scanner baseliner monitoring and control in high volume manufacturing P Samudrala, WJ Chung, N Aung, L Subramany, H Gao, JM Gomez Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | | 2016 |
