Nondestructive imaging of atomically thin nanostructures buried in silicon G Gramse, A Kölker, T Lim, TJZ Stock, H Solanki, SR Schofield, ... Science advances 3 (6), e1602586, 2017 | 77 | 2017 |
Atomic-scale patterning of arsenic in silicon by scanning tunneling microscopy TJZ Stock, O Warschkow, PC Constantinou, J Li, S Fearn, E Crane, ... ACS nano 14 (3), 3316-3327, 2020 | 58 | 2020 |
Nanoscale imaging of mobile carriers and trapped charges in delta doped silicon p–n junctions G Gramse, A Kölker, T Škereň, TJZ Stock, G Aeppli, F Kienberger, ... Nature Electronics 3 (9), 531-538, 2020 | 38 | 2020 |
Copper phthalocyanine thin films on Cu (111): Sub-monolayer to multi-layer TJZ Stock, J Nogami Surface Science 637, 132-139, 2015 | 18 | 2015 |
Tunneling electron induced chemisorption of copper phthalocyanine molecules on the Cu (111) surface T Stock, J Nogami Applied Physics Letters 104 (7), 2014 | 17 | 2014 |
Resistless EUV lithography: Photon-induced oxide patterning on silicon LT Tseng, P Karadan, D Kazazis, PC Constantinou, TJZ Stock, NJ Curson, ... Science Advances 9 (16), eadf5997, 2023 | 11 | 2023 |
High-energy photoemission final states beyond the free-electron approximation VN Strocov, LL Lev, F Alarab, P Constantinou, X Wang, T Schmitt, ... Nature Communications 14 (1), 4827, 2023 | 10 | 2023 |
EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning P Constantinou, TJZ Stock, LT Tseng, D Kazazis, M Muntwiler, CAF Vaz, ... Nature Communications 15 (1), 694, 2024 | 9 | 2024 |
Hydrogen resist lithography and electron beam lithography for fabricating silicon targets for studying donor orbital states E Crane, A Köolker, TZ Stock, N Stavrias, K Saeedi, MAW Van Loon, ... Journal of Physics: Conference Series 1079 (1), 012010, 2018 | 9 | 2018 |
CuPc:C60 nanocomposite: A pathway to control organic microstructure and phase transformation TJZ Stock, T Ogundimu, JM Baribeau, ZH Lu, J Nogami physica status solidi (b) 252 (3), 545-552, 2015 | 6 | 2015 |
Non‐Destructive X‐Ray Imaging of Patterned Delta‐Layer Devices in Silicon N D'Anna, D Ferreira Sanchez, G Matmon, J Bragg, PC Constantinou, ... Advanced Electronic Materials 9 (5), 2201212, 2023 | 5 | 2023 |
Spatially Resolved Dielectric Loss at the Interface M Cowie, TJZ Stock, PC Constantinou, NJ Curson, P Grütter Physical Review Letters 132 (25), 256202, 2024 | 4 | 2024 |
Benchmarking of X‐Ray Fluorescence Microscopy with Ion Beam Implanted Samples Showing Detection Sensitivity of Hundreds of Atoms MG Masteghin, T Gervais, SK Clowes, DC Cox, V Zelyk, A Pattammattel, ... Small Methods, 2301610, 2024 | 3 | 2024 |
Momentum‐Space Imaging of Ultra‐Thin Electron Liquids in δ‐Doped Silicon P Constantinou, TJZ Stock, E Crane, A Kölker, M van Loon, J Li, S Fearn, ... Advanced Science 10 (27), 2302101, 2023 | 3 | 2023 |
Bismuth trichloride as a molecular precursor for silicon doping EAS Lundgren, R Conybeare, TJZ Stock, NJ Curson, O Warschkow, ... Applied Physics Letters 122 (15), 2023 | 3 | 2023 |
Room temperature incorporation of arsenic atoms into the germanium (001) surface EVS Hofmann, TJZ Stock, O Warschkow, R Conybeare, NJ Curson, ... Angewandte Chemie 135 (7), e202213982, 2023 | 3 | 2023 |
Are high-energy photoemission final states free-electron-like? VN Strocov, LL Lev, F Alarab, P Constantinou, T Schmitt, TJZ Stock, ... arXiv preprint arXiv:2301.00033, 2022 | 3 | 2022 |
The formation of a Sn monolayer on Ge (1 0 0) studied at the atomic scale EVS Hofmann, E Scalise, F Montalenti, TJZ Stock, SR Schofield, ... Applied Surface Science 561, 149961, 2021 | 3 | 2021 |
Single‐Atom Control of Arsenic Incorporation in Silicon for High‐Yield Artificial Lattice Fabrication TJZ Stock, O Warschkow, PC Constantinou, DR Bowler, SR Schofield, ... Advanced Materials, 2312282, 2024 | 2 | 2024 |
Adsorption and Thermal Decomposition of Triphenyl Bismuth on Silicon (001) EAS Lundgren, C Byron, P Constantinou, TJZ Stock, NJ Curson, ... The Journal of Physical Chemistry C 127 (33), 16433-16441, 2023 | 2 | 2023 |